FOAM POLISHING PAD MEDIUM DENSITY - T-01236
FOAM POLISHING PAD MEDIUM DENSITY - T-01236
Quantity available : 7
Warehouse La Prairie (1)
Warehouse Sherbrooke (2)
Warehouse St-Hubert (4)
Availability to come : 0
Brand:
MAKITA
Features:
Partially closed cells are strategically patterned to drastically improve polishing performance by evenly dispersing compound/polishing onto the working surface
Slower rate of polish absorption enhances polishing performance
Reduced surface tension allows operator to run pad flat on the working surface with greatly minimized pad skipping
CCS pockets gradually release compound/polish as required, resulting in increased operator control
Reduced surface contact generates less friction and heat
Curved edges enable easier polishing in corners and along edges
Hook and Loop backing
Machine wash in warm water and air dry to clean
| Manufacturer | Makita |
|---|---|
| incomming qty | 0.00 |